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作 者:余韬[1] 马晓燕[1] 李毅卓 栗志广[1] 强秀[1]
机构地区:[1]西北工业大学空间应用物理与化学教育部重点实验室和陕西省高分子科学与技术重点实验室,西安710129
出 处:《材料研究学报》2014年第1期8-14,共7页Chinese Journal of Materials Research
摘 要:采用一锅逐步加料的原子转移自由基聚合方法(ATRP)制备了一种蝌蚪型多面体低聚倍半硅氧烷(POSS)丙烯酸酯嵌段共聚物,并用静态呼吸图法制备该共聚物蜂窝状结构的多孔膜,研究成膜条件如溶剂种类、聚合物浓度、相对湿度等对聚合物多孔膜形貌的影响,以及空气/硅片、空气/水和空气/冰3种成膜界面对膜形貌的影响。结果表明,在空气/硅片界面上,以三氯甲烷为溶剂,环境相对湿度为80%,浓度为20 mg·mL-1时,可形成圆形孔的多孔膜,孔排列成六方形;在相同的条件下在空气/水和空气/冰界面上均可制备出类似规整形貌的多孔结构,但多孔膜的孔径、孔间距有很大的不同,在空气/冰界面上的孔径更小、孔间距更窄。这种多孔膜具有良好的疏水性,且其接触角随着孔径的减小而增大;该多孔膜还具有良好的耐强酸强碱性和耐热性能。A honeycomblike porous film has been fabricated from a homogeneous solution of tadpole POSS acrylate block copolymer (POSS-PMMA-b-PS), which was made via atom transfer radial polymer- ization (ATRP) polymerization in one pot, using the static breath figures method. Taking into account of the formation mechanism of the pore, the influencing factors, such as the kind of solvent, the concentra- tion of the solution and relative humidity for the formation of self-assembled block copolymer membrane, have been evaluated, and especially, the effects of interfaces, including air/glass wafer, air/water and air/ ice interfaces, were investigated. The results show that cycloidal bubble arrays can be prepared when chloroform was chosen as solvent, concentration of POSS-PMMA-b-PS was 20 mg-mL-1, relative humidi- ty was 80%, and the solution was cast on the air/glass wafer interface; well-patterned membrane can al- so be prepared when the solution was cast on air/water and air/ice interfaces in the same condition; nev- ertheless, the pore size and hole spacing of the latter was much smaller. The result of static contact an- gle with water analysis shows that this porous film has good hydrophobic performance, and the contact angle increases with the decrease of pore size; the porous film shows excellent resistance to acid, alka- line and heat.
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