高频脉冲电源参数对Fe-ZrO_2复合电沉积镀层纳米含量的影响  

Effects of High Frequency Pulse Power Parameters of Fe-ZrO_2 Composite Electrodeposition Coating Surface Nano Content

作　　者：闫帅[1] 王元刚[1] 宁智[1] 赵子云[1] 吴蒙华[1] 

机构地区：[1]大连大学机械工程学院,辽宁大连116622

出　　处：《大连大学学报》2013年第6期6-8,共3页Journal of Dalian University

基　　金：国家自然科学基金项目(51005027);辽宁省高等学校杰出青年学者成长计划项目(LJQ2012106);辽宁省教育厅一般项目(L2012446)

摘　　要：为改善低温镀铁工艺镀层的耐磨损耐腐蚀性能,提高镀层表面硬度,以GKDM系列高频脉冲电镀电源为实验复合电沉积工艺电源并配合超声-机械搅拌制备纳米Fe-ZrO2镀层。研究了高频脉冲电源参数:峰值电流导通(TON)、关闭(TOFF)时间;一组正脉冲(TF)负脉冲(TR)的工作时间对镀层表面纳米含量的影响。结果表明当GKDM系列高频脉冲电源TON=20?0.1 ms,TOFF=80?0.1 ms时,纳米沉积分布均匀致密,质量分数高。In order to improve the corrosion and wear of low-temperature iron plating coatings and improve the surface hardness of the coating, GKDM series high-frequency pulse plating power as the experimental composite electrodeposition process power, and with ultrasound - mechanical stirring Nano Fe-ZrO2 coating was made. the parameters of High-frequency pulse power were studied： peak current conduction （TON） closing （TOFF） time; a positive pulse of working （TF） time, a negative pulse of working time impacting on the content of the coating surface nano. The results showed that when TON of the GKDM series high frequency pulse power was 20×0.1 ms, TOFF was 80×0.1 ms, Nano Deposition evenly distributed and dense, quality scores was high.

关 键 词：低温镀铁 GKDM系列高频脉冲电源 复合电沉积 峰值电流 正脉冲 负脉冲 

分 类 号：TG249.9[金属学及工艺—铸造]