氟掺杂氧化锡薄膜的椭偏光谱研究  

Study on Ellipsometric Spectra of Fluorine Doped Tin Oxide Thin Film

作　　者：石丽芬[1] 甘治平[1] 王东[1] 单传丽[1] 金良茂[1] 

机构地区：[1]蚌埠玻璃工业设计研究院,安徽蚌埠233010

出　　处：《中国玻璃》2013年第6期8-11,共4页China Glass

摘　　要：采用常压化学气相沉积法在玻璃基底上沉积氟掺杂氧化锡（FTO）薄膜。利用椭偏法测试了玻璃基底的折射率以及薄膜的厚度和折射率。建立了FTO薄膜的四层结构模型。采用Tauc—Lorentz色散模型对椭偏参量ψ和△进行了拟合。拟合数据和实测数据吻合良好。根据拟合结果得到，玻璃基底的折射率为1．514。FTO薄膜的折射率在1．63-1．88之间。在633nm波长处，折射率n=1．681，总膜厚为221．5nm。Fluorine doped tin oxide thin film （FTO） was deposited on the glass substrate by atmospheric pressure chemical vapor deposition. The refractive index of glass substrate and FTO thin film as well as the thickness of FTO thin film were measured by spectroscopic ellipsometry method. The four - layer structure model of FTO thin film was established. The Taue -Lorentz dispersion model was selected to fit the ellipsometry -measured parametersψand △. The fitted data are in good agreement with the measured data. According to the fitting result, the refractive index of glass substrate is 1. 514. The refractive index of FTO thin film varied between 1.63 and 1.88. The refractive index and the total thickness of the FTO thin film were respectively 1. 681 and 221.5nm when the wavelength was 633nm.

关 键 词：FTO薄膜 光谱椭偏法 椭偏建模及解析 

分 类 号：O511[理学—低温物理]