聚酰亚胺／SiO2杂化薄膜的研究进展  

Research development of polyimide/silica hybrid films

作　　者：陈银珊 侯琼[1] 罗穗莲[1] 石光[1] 杜钧仪 陈建平 

机构地区：[1]华南师范大学化学与环境学院广东高校高分子新型材料产学研结合示范(暨研究生创新培养)基地,广州510006 [2]中山市东溢新材料有限公司,中山528455

出　　处：《化工新型材料》2014年第1期19-20,23,共3页New Chemical Materials

基　　金：广东省教育部产学研结合项目(2012B091000131)

摘　　要：随着聚酰亚胺/二氧化硅(PI/SiO2)杂化薄膜的优异性能逐渐被人们所认识,近年来出现了众多关于SiO2改性聚酰亚胺的研究,但关于产业化的报道仍较少。本文综述了PI/SiO2杂化薄膜的合成工艺、制备方法、制备过程的影响因素和存在的问题,指出了杂化薄膜今后的发展趋势和努力方向。With the outstanding performance of polyimide/silica hybrid films was gradually known by people, there appeared a large number of researches on silicon dioxide modified polyimide in recent years. The research situation, preparation methods and the influence factors of the preparation process of the films were summarized, the present problems and development direction in the future were pointed out.

关 键 词：聚酰亚胺 二氧化硅 杂化 溶胶一凝胶法 

分 类 号：TB383.2[一般工业技术—材料科学与工程]