化学辅助软性磨粒流抛光技术  

Research of Softness Abrasive Flow Machining Assisted by Chemical Polishing

作　　者：马宝丽[1,2] 计时鸣[1] 谭大鹏[1] 

机构地区：[1]特种装备制造与先进加工技术教育部/浙江省重点实验室(浙江工业大学),浙江杭州310014 [2]杭州师范大学钱江学院,浙江杭州310012

出　　处：《轻工机械》2014年第1期115-118,共4页Light Industry Machinery

基　　金：国家自然科学基金面上项目(No.50875242);国家自然科学基金面上项目(No.50905163);浙江省自然科学基金重点项目(No.Z107517)

摘　　要：针对当前模具结构化表面抛光难度大的问题,提出了一种新型的光整加工技术——化学辅助软性磨粒流抛光。阐述了化学抛光、软性磨粒流抛光的工作原理以及相互协调作用机理,对化学抛光液中各组分的抛光作用进行分析,探讨了软性磨粒流中流体的速度、磨粒的粒径与体积含量3个主要工艺参数对材料去除率的影响规律,提出固液两相流场的数值模拟、环保型化学液的配置以及理论模型的建立是3个关键技术,最后对化学辅助软性磨粒流抛光应用前景进行展望。As far as the problem that it was difficult to polish the structured surface of mould Soft Abrasive Flow Machining （SAFM） assisted by chemical polishing was put forward as the new finishing technique. The working principle of chemical polishing and SAFM accompanied with their coordination mechanism was explained firstly. Then the polishing effect of different components in chemical polishing solution was analyzed. The influence law how the main three process parameters, such as fluid velocity, particle size and volume ration, affected the material removal rate was discussed. In the following three kinds of key technology consisted of numerical simulation of solid-liquid two-phase flow, configuration of environmentally friendly chemical solution and the establishment of theoretical model was developed. At last, the prospect of SAFM assisted by chemical polishing was discussed.

关 键 词：软性磨粒流抛光 化学抛光 抛光机理 结构化表面 

分 类 号：TG7[金属学及工艺—刀具与模具]