Preparation and performance evaluation of Er_2O_3 coating-type selective emitter  

作　　者：WANG HuJun YE Hong ZHANG YuZhi 

机构地区：[1]Department of Thermal Science and Energy Engineering, University of Science and Technology of China [2]Key Laboratory of Inorganic Coating Materials,Shanghai Institute of Ceramics, Chinese Academy of Sciences

出　　处：《Science China(Technological Sciences)》2014年第2期332-338,共7页中国科学（技术科学英文版）

基　　金：supported by the Key Laboratory of Inorganic Coating Materials,Chinese Academy of Sciences;the Fundamental Research Funds for the Central Universities

摘　　要：An Er203 coating-type selective emitter for themophotovoltaic application was prepared by plasma spray technology. The test results show that plasma spray technology could be used to prepare the Er203 coating-type selective emitter with good stability at 1400℃. Based on the measurements of the high temperature normal spectral emissivity and the spectral hemispherical emissivity of the samples at room temperature, the influence of the coating thickness was discussed, and the selective emission performance of the sample was evaluated using radiative efficiency as the criterion. The results demonstrate that the emission of substrate could not be neglected unless the coating thickness would be larger than the penetration depth, which is around 100 μm. The selective emission peak of the Er203 coating occurs at 1550 nm, matching well with the GaSb cells. However, the radiative efficiency is not larger than that of the SiC emitter, because the non-convertible emission of 1.725-5 μm accounts for a large proportion of the total radiation power, especially at high temperature. Effective suppression of this band emission is essential to the improvement of the radiation efficiency of the emitter.

关 键 词：THERMOPHOTOVOLTAIC Er203 radiative efficiency high temperature emissivity 

分 类 号：O614.344[理学—无机化学]