PS/CeO_2核壳型复合磨粒的微晶玻璃抛光试验研究  

Experimental Study of Zerodur Glass Polishing with Core-shell Structured PS/CeO_2 Composite Abrasives

作　　者：朱良健 滕霖[1] 白满社[1] 张晋宽[1] 

机构地区：[1]中航工业西安飞行自动控制研究所,西安710065

出　　处：《航空精密制造技术》2014年第1期1-4,共4页Aviation Precision Manufacturing Technology

基　　金：航空重点基金资助项目(20130818005)

摘　　要：为获得同时具有低表面粗糙度和高面形精度的微晶玻璃基片,利用PS(聚苯乙烯)微球和CeO2磨粒制备出核壳型复合磨粒,替代了单一CeO2磨粒进行抛光试验。通过全因子试验研究PS微球粒径和质量浓度对微晶玻璃基片的材料去除率(MRR)、表面粗糙度和面形精度的影响。试验表明:MRR随着PS微球质量浓度的增大而减小,随着PS微球粒径的增大而增大;PS微球粒径为20μm时,工件塌边显著减小;表面粗糙度随着PS微球浓度的增大而增大。In order to achieve low surface roughness and high surface figure accuracy of Zerodur glass substrate simultaneously, the polishing experiment was taken by using core-shell structured composite abrasives which were synthesized using PS microspheres and CeO2 abrasives to substitutemono CeO2 abrasives. The effect of particle size and weight concentration of PS microsphere on material removal rate （MRR）, surface roughness and surface figure accuracy of Zerodur glass substrate was investigated by full factorial experiments. The result shows that the MRR decreases as weight concentration of PS microspheres grows and increases as the particle size of PS microspheres grows; high surface figure accuracy and small edge roll off of Zerodur glass substrate was obtained when the particle size of PS microspheres is 20μm; surface roughness of Zerodur glass substrate becomes higher as the weight concentration of PS microspheres grows.

关 键 词：核壳型复合磨粒 塌边 微晶玻璃 抛光 

分 类 号：TN305.2[电子电信—物理电子学]