检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
机构地区:[1]华南农业大学理学院,广东广州510642 [2]广州市二轻工业科学技术研究所,广东广州510170
出 处:《电镀与涂饰》2014年第4期142-144,共3页Electroplating & Finishing
摘 要:在由26.8g/L NiSO_4.6H_2O、150 mL/L BH-320B和30mg/L稳定剂组成的酸性化学镀镍液中,研究了电镀镍用中间体ATQM、SSO3、MPA和DEP对沉积速率、镀层性能和镀液稳定性的影响。结果表明,ATQM和SSO3可作为化学镀镍液的促进剂,MPA和DEP可用作化学镀镍液的光亮剂。此外,MPA和SSO3还对化学镀镍液起辅助稳定剂的作用。镀液中不同添加剂的存在对镀层结构无明显影响,所得镀层均为非晶态结构。The effects of nickel electroplating intermediates including ATQM, SSO3, MAP, and DEP on the deposition rate, coating performances, and bath stability of electroless nickel plating in an acidic bath consisting of NiSO4'6H20 26.8 g/L, BH-320B 150 mL/L, and stabilizer 30 mg/L were studied. It was found that ATQM and SSO3 can be used as accelerators in electroless nickel plating, while MPA and DEP can be used as brighteners. MPA and SSO3 play a part of auxiliary stabilizer in electroless nickel plating bath. The existence of different additives in electroless nickel plating bath has no effect on the structure of coating and all of the obtained coatings are amorphous.
分 类 号:TQ153.12[化学工程—电化学工业]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:18.117.8.41