脉冲激光诱导TiO_2/SiO_2薄膜表面损伤性能实验  

Surface damage performance experiment of TiO_2/SiO_2 thin tilm by pulsed laser induced

作　　者：杨利红[1] 王涛[1] 韩锦涛[1] 苏俊宏[1] 

机构地区：[1]西安工业大学光电工程学院,陕西西安710032

出　　处：《红外与激光工程》2014年第2期365-368,共4页Infrared and Laser Engineering

基　　金：国家自然科学基金(61378050);国家国际科技合作专项(2013DFR70620);陕西省教育厅资助项目(12JK0996)

摘　　要：高功率的激光系统对光学元件的抗激光损伤性能的要求不断提高。主要研究薄膜在脉冲激光诱导作用下的损伤特性及其机理,实验采用YAG脉冲激光器对TiO2/SiO2薄膜样片进行1-on-1方式的激光诱导。实验结果表明:采用低能量激光诱导对薄膜的光学透过率影响不大。经低能量激光诱导后,薄膜的表面结构缺陷得以修复,表面结构趋于完整,变得均匀和细腻。脉冲激光诱导TiO2/SiO2薄膜样片,激光能量阶较小时,其损伤阈值随能量增加而增加,损伤阈值最大可增加1倍;激光能量阶较大时,其损伤阈值随能量增加而减小。Demand for optical element resistance of laser damage is higher and higher in the high power laser system. The damage characteristics and mechanism of film by pulse laser induced damage was researched. The experiments used by YAG pulsed laser for TiO2/SiO2 thin film were offered for 1-on-1 way of laser induced. The experimental results show that the impact on the optical transmittance of thin film is not big in low energy laser induced. Under the low energy laser induced, film surface structure defect is repaired . The surface structure tends to be complete , and becomes uniform and fine . Under pulsed laser induced TiO2/SiO2 thin film, when the laser energy order is smaller, the laser damage threshold of thin film increases with the increased energy, damage threshold maximum can increase 1 times. When the laser energy order is bigger, thin film damage threshold decreases with the increased energy order.

关 键 词：激光诱导 损伤阈值 激光能量阶 

分 类 号：TN248[电子电信—物理电子学]