光敏表面活性剂胶束体系的研究进展  

Progress in research work with respect to photosensitive surfactant micelle system

作　　者：郁丽程 陈洁[1] 方波[1] 吕婷阳[1] 王进爽[1] 金浩[1] 

机构地区：[1]华东理工大学化工学院流变学研究室,上海200237

出　　处：《日用化学工业》2014年第3期151-154,共4页China Surfactant Detergent & Cosmetics

基　　金：国家自然科学基金资助项目(21273072)

摘　　要：综述了近年来光敏流变胶束体系的研究进展,包括光稀化体系、光凝胶体系和光流变可逆胶束体系及其流变特性。介绍了光敏胶束体系的形成原理。进一步对光敏胶束体系的相关研究和应用前景提出了建议和展望。Progress in research work with respect to photorheological micelles, including photothinning fluids, photogelling fluids and reversible photorheological micelle system was reviewed. Mechanism for formation of photosertsitive micelle system was described. Further concerning research work and applications in this field were prospected.

关 键 词：表面活性剂 光稀化体系 光凝胶体系 光流变可逆体系 

分 类 号：TQ423[化学工程]