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作 者:K.Ravichandran K.Thirumurugan
机构地区:[1]Post Graduate and Research Department of Physics,AVVM Sri Pushpam College(Autonomous)
出 处:《Journal of Materials Science & Technology》2014年第2期97-102,共6页材料科学技术(英文版)
基 金:Financial support from the University Grants Commission ofIndia through the Major Research Project(F.No.40-28/2011(SR));the DST Grant(D.O.No.SR/S2/CMP-35/2004)
摘 要:Aluminium doped tin oxide films have been deposited onto glass substrates by using a simplified and low cost spray pyrolysis technique. The AI doping level varies between 0 and 30 at.% in the step of 5 at.%. The resistivity (p) is the minimum (0.38 Ω cm) for 20 at.% of AI doping. The possible mechanism behind the phenomenal zig-zag variation in resistivity with respect to AI doping is discussed in detail. The nature of conductivity changes from n-type to p-type when the AI doping level is 10 at.%. The results show that 20 at.% is the optimum doping level for good quality p-type SnO2:AI films suitable for transparent electronic devices.Aluminium doped tin oxide films have been deposited onto glass substrates by using a simplified and low cost spray pyrolysis technique. The AI doping level varies between 0 and 30 at.% in the step of 5 at.%. The resistivity (p) is the minimum (0.38 Ω cm) for 20 at.% of AI doping. The possible mechanism behind the phenomenal zig-zag variation in resistivity with respect to AI doping is discussed in detail. The nature of conductivity changes from n-type to p-type when the AI doping level is 10 at.%. The results show that 20 at.% is the optimum doping level for good quality p-type SnO2:AI films suitable for transparent electronic devices.
关 键 词:Tin oxide films P-type transparent conducting oxide (TCO) Spray pyrolysis Transparent electronics Electrical properties Optical properties
分 类 号:TB383.2[一般工业技术—材料科学与工程]
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