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机构地区:[1]四川大学
出 处:《光电工程》1991年第4期34-42,共9页Opto-Electronic Engineering
摘 要:本文分析了均匀混合介质薄膜折射率的三种理论计算方法,计算并实测了不同重量比的ZnS—CeF_3均匀混合薄膜的折射率。介绍了制备和研究混合薄膜的实验装置、淀积参数和镀制工艺。研究结果表明,ZnS重量比在混合膜中为40%或以下时,实测结果与理论计算值一致,其折射率的取值范围为1.70~1.95。本文还给出了ZnS—CeF_3混合薄膜样品的X射线衍射(XRD)和扫描电子显微镜(SEM)的实验结果,对其微观结构和结晶形态的分析与折射率的实测结果一致。最后,本文给出了两个ZnS—CeF_3混合薄膜的应用实例,它表明了该混合薄膜具有广泛的应用前景。Three theoretical calculating methods arc offered for analysing the refractive index of homogeneously mixed dielectric film, and the values of the refractive index with different weight percentage of ZnS and CeF_3 were calculated and tested. This paper also presents the experimental device of preparing and studying the mixed coatings, the depositing parameters and the evaporating technology. As a result, the tested values are in agreement with the theoretical calculating values when ZnS is less than 40% in the mixed coatings, the values of the refractive index are from 1.70 to 1.95 in this area. The paper also shows that experimental results of X-ray diffraction (XRD) and scanning electron microscope (SEM) for the mixed film. The microstructural and crystallographic analysis for the mized coatings corresponds to the theoretical calculations, experimental results of the refractive index. In the end the paper shows two applying examples of the mixed film, which show the widely promising applications of the mixed film.
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