移动抛光自由曲面材料去除的理论建模与试验研究  

Modeling and Experimental Study on the Material Removal in the Velocity-dwell-mode Polishing Process

作　　者：樊成[1] 赵继[1] 张雷[1] 顾天奇[1] 周宛松 

机构地区：[1]吉林大学机械科学与工程学院,长春130025

出　　处：《机械工程学报》2014年第5期173-181,共9页Journal of Mechanical Engineering

基　　金：国家重点基础研究发展计划(973计划;2011CB706702);吉林大学研究生创新基金(20121078)资助项目

摘　　要：针对计算机控制抛光加工中自由曲面零件精确修形的需求,研究抛光盘移动抛光时材料去除廓形的特点,重点对轨迹过渡区域的材料去除进行建模。运用对单位轨迹长度材料去除率在接触区域内沿着抛光轨迹积分的方法,求解垂直于抛光轨迹的材料去除廓形。对直线轨迹和圆弧轨迹在过渡转角垂直平分线上的材料去除进行分类讨论,在此基础上对轨迹过渡区域抛光去除廓形进行计算,并通过试验对模型进行验证。研究结果表明,移动抛光时轨迹过渡区域材料去除不均匀,抛光轨迹半径和过渡圆弧角度均对材料去除廓形有影响。将理论与试验相结合,揭示了抛光轨迹对材料去除廓形的影响,对抛光工艺参数设计和轨迹规划有一定的指导意义。With the demand of improving the form accuracy of free-form surface by computer-controlled polishing, a theoretical investigation is presented on the material removal for the velocity-dwell-mode polishing process. Especially, the material removal profile as the sub-aperture tool polishes at the path comer is modeled. The material removal profile perpendicular to the polishing path can be calculated by integrating the wear index, the polished depth at unit length of polishing path, along the tool path in the contact region. The effects of the straight path and arc path on the polished profile at the bisector of the path arc angle are discussed in different cases. On the basis above, the polished profile at the path comer is modeled and a series of experiments are conducted to verify the proposed model. According to the experimental results, the material removal at the path comer is uneven, and the path radius and arc angle both affect the material removal profile during the velocity-dwell-mode polishing. The proposed model is votentiallv useful for the Dlarmine of tool path and nrocess Parameters in the nolishing nrocess.

关 键 词：计算机控制抛光 自由曲面 材料去除 轨迹过渡区域 

分 类 号：TG161[金属学及工艺—热处理]