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机构地区:[1]华南理工大学化学与化工学院,广东广州510640 [2]广东致卓精密金属科技有限公司,广东佛山528247
出 处:《电镀与涂饰》2014年第5期185-188,共4页Electroplating & Finishing
摘 要:在由70 g/L Cr2(SO4)3、30 g/L HCOONa·2H2O、15 g/L NH2CH2COOH、80 g/L K2SO4、120 g/L Na2SO4、60 g/L H3BO3、和0.05 g/L C12H25NaSO4组成的基础镀液中,研究了含硫添加剂SN、WS、SH、TS和有机胺类添加剂TH对三价铬镀铬工艺和镀层性能的影响。结果表明,5种添加剂均可改善镀液分散能力和覆盖能力,拓宽允许的阴极电流密度范围,提高阴极电流效率。基础镀液中添加不同添加剂时,所得铬镀层的耐蚀性、表面形貌和色泽有差异。SN、SH、TS、TH可用作三价铬电镀白铬添加剂,WS则适用于三价铬电镀黑铬。The effects of some sulfur-containing additives including SN, WS, SH, and TS and an organic amine additive TH on trivalent chromium plating in a bath containing 70 g/L Cr2(SO4)3, 30 g/L HCOONa'2H20, 15 g/L NH2CHECOOH, 80 g/L K2SO4, 120 g/L Na2SO4, 60 g/L HaBO3, and 0.05 g/L C12H25NaSO4, and performances of the coatings obtained therefrom were studied. The results showed that all of the additives studied can improve the throwing and covering power of plating bath, enlarge the available current density range, and increase the cathodic current efficiency. The corrosion resistance, surface morphology, and color of the chromium coatings prepared are different when adding different additives to the sulfate bath. SN, SH, TS, and TH can be used as the additive for white chromium plating, while WS is suitable for black chromium plating.
分 类 号:TQ153.11[化学工程—电化学工业]
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