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作 者:温慧娟 张进成 陆小力 王之哲 哈微 葛莎莎 曹荣涛 郝跃
出 处:《Chinese Physics B》2014年第3期489-492,共4页中国物理B(英文版)
基 金:Project supported by the National Science and Technology Major Project of the Ministry of Science and Technology of China(Grant Nos.2011ZX01002-002 and 2013ZX02308-002);the Fundamental Research Funds for the Central Universities of Ministry of Education of China;the National Natural Science Foundation of China(Grant Nos.61204006 and 61106063)
摘 要:The quality of an A1GaN channel heterojunction on a sapphire substrate is massively improved by using an A1- GaN/GaN composite buffer layer. We demonstrate an A10.4Gao.6N/AI0.18Ga0.82N heterojunction with a state-of-the-art mobility of 815 cm2/(V.s) and a sheet resistance of 890Ω/口 under room temperature. The crystalline quality and the electrical properties of the A1GaN heterojunction material are analyzed by atomic force microscopy, high-resolution X-ray diffraction, and van der Pauw Hall and capacitance-voltage (C-V) measurements. The results indicate that the improved electrical properties should derive from the reduced surface roughness and low dislocation density.The quality of an A1GaN channel heterojunction on a sapphire substrate is massively improved by using an A1- GaN/GaN composite buffer layer. We demonstrate an A10.4Gao.6N/AI0.18Ga0.82N heterojunction with a state-of-the-art mobility of 815 cm2/(V.s) and a sheet resistance of 890Ω/口 under room temperature. The crystalline quality and the electrical properties of the A1GaN heterojunction material are analyzed by atomic force microscopy, high-resolution X-ray diffraction, and van der Pauw Hall and capacitance-voltage (C-V) measurements. The results indicate that the improved electrical properties should derive from the reduced surface roughness and low dislocation density.
关 键 词:AlGaN channel HETEROJUNCTION MOBILITY electrical properties
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