单晶硅表面制绒及其特性研究  

Study on the Property and Texturing of Monocrystalline Silicon Surface

作　　者：戴小宛 张德贤[1,2] 蔡宏琨[1,2] 仲玉泉 于倩[1] 苏超[1] 

机构地区：[1]南开大学信息技术科学学院电子科学与微电子系,天津300071 [2]天津市光电子薄膜器件与技术重点实验室,天津300071

出　　处：《人工晶体学报》2014年第2期308-313,共6页Journal of Synthetic Crystals

基　　金：国家重点基础研究发展计划(973计划)(2012CB934201);国家高技术研究发展计划(863计划)(2011AA050513);中央高校基本科研业务费专项资金(65012001)

摘　　要：研究了在不同的碱液(NaOH,Na2CO3,NaHCO3,Na2SiO3,Ca(OH)2,CH3COONa)和异丙醇(IPA)制绒下单晶硅表面金字塔结构的变化情况,使用分光光度计测量了不同结构表面的反射率变化。结果表明,金字塔绒面的表面反射率与金字塔结构及大小分布情况有关,实验中获得的最低表面反射率为7.8%。金字塔结构断面SEM图显示金字塔顶角在断面上的投影角度不会随反应条件和金字塔大小改变,维持在80°左右。最后,通过制绒后硅片表面金字塔形貌的扫描电镜图样和反射率的分析,提出了织构率α的概念,得到了快速了解单晶硅表面金字塔覆盖率的方法。The pyramid structure change on the surface of the monocrystalline silicon textured by different alkaline solutions（NaOH, Na2CO3, NaHCO3, Na2SiO3, Ca（OH）2, CH3COONa） and isopropyl alcohol （IPA） were studied. The surface reflectance was measured by spectrophotometer. The results show that the reflectance of the pyramidal structure is related to the pyramid shape and distribution. The lowest reflectance is 7.8% in the experiment. The cross-section SEM image show that the apex angle of the pyramidal structure maintained around 80° and did not obviously depended on the reaction condition and the size of pyramid. By analysis the relationship between textured silicon surface （SEM images） and its corresponding reflectance, the concept of texturing ratio a and average reflectance Rα were proposed, which can quickly test the texturing ratio of monocrystalline silicon.

关 键 词：单晶硅 陷光结构 织构率 反射率 

分 类 号：TK514[动力工程及工程热物理—热能工程] TM914.4[电气工程—电力电子与电力传动]