绝对式光栅尺母光栅刻划装置的设计  

Design of a Master Grating Scribing Device for Absolute Linear Encoder

作　　者：郑黎明[1] 谭向全[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,吉林长春130033

出　　处：《机电产品开发与创新》2014年第2期108-109,79,共3页Development & Innovation of Machinery & Electrical Products

基　　金：国家科技重大专项(2013ZX04007021)

摘　　要：简述了绝对式光栅尺母光栅刻划装置的设计方案。针对曝光光源均匀性、图案畸变、精确放大倍率等难点问题,设计了刻划装置的专业装调方案。同时利用刻划装置的物理样机进行曝光加工,得到了满足设计要求的母光栅码道图案。The design scheme of a master grating scribing device for absolute linear encoder is briefly introduced. According to the assembling difficult problems, such as the uniformity of lithography source, the image distortion and the accurate magnification, the assembling scheme is designed. Meanwhile, the lithography processing is achieved by using the physical prototype of scribing device, and the code channel pattern of master grating is obtained, which can meet the design requirements.

关 键 词：绝对式光栅尺 母尺光栅 刻划装置 曝光光源 

分 类 号：TG68[金属学及工艺—金属切削加工及机床]