直接电位法快速测定铬酐镀铬液中三价铬含量的研究  

The Study of Direct Potentiometry Rapid Determination of the Quantity of Chromium(Ⅲ) in Chromic Anhydride Chromium Plating Solution

作　　者：郑雄卿 

机构地区：[1]华南理工大学应用化学系

出　　处：《广州化工》1991年第2期79-83,共5页GuangZhou Chemical Industry

摘　　要：本文提出用电位法测定铬酐镀铬液中三价铬的含量,测定必须在碱性条件下进行,并加入适量的铁氰化钾以调节、稳定电位。测定迅速,可在1—3分钟内完成,测定结果准确度较高,不受镀液中F—53铬雾抑制剂及Fe^(3+)、Cu^(2+)、Zn^(2+)、Ni^(2+)等少量杂质离子的干扰。This paper uses the potentiometry to measare the quantity of chromium(Ⅲ) in chromic anhydride chromium plating solution, measure-ment must be on condition that basicity and proper dose of potassium ferricyanide is added to it in order to regulate and stabilize the potential, So the determination is rapid and can be finished within 1-3 minutes. The accuracy of determination is high It should not be disturbed by F-53 chromium fog suppression agent and trace impurity ions of Fe^(3+)、Cu^(2+)、Zu^(2+), Ni^(2+) etc. in chromium plating solution.

关 键 词：镀铬 镀液 铬酐 直接电位法 测定 

分 类 号：TQ153.11[化学工程—电化学工业]