CVD金刚石薄膜摩擦学性能的研究现状  

Current Research Status of Tribological Properties of CVD Diamond Films

作　　者：孙洪涛[1] 王小平[1] 王丽军[1] 孙义清[1] 王金烨[1] 王子风 曹双迎 

机构地区：[1]上海理工大学理学院,上海200093

出　　处：《材料导报》2014年第5期47-52,73,共7页Materials Reports

基　　金：上海市教委重点创新项目(14ZZ137);国家大学生创新创业训练计划项目(121025243;131025228)

摘　　要：化学气相沉积(Chemical vapor deposition,CVD)金刚石薄膜通常是一种表面粗糙的多晶薄膜,其摩擦系数相对于光滑金刚石明显偏高,这制约着其在摩擦学领域的应用。在综合分析近年来该领域研究的基础上,总结了CVD金刚石薄膜摩擦学性能的主要影响因素,并从降低其摩擦系数的角度出发,着重讨论了几种提高CVD金刚石薄膜摩擦性能的途径。Diamond films grown by chemical vapor deposition（CVD） are usually a kind of polycrystalline thin films with rough surface, of which the friction coefficient is higher than smooth diamond, thus restricting its applica- tion in the field of tribology. The main factors influencing the tribology performance of CVD diamond film based on comprehensive analysis of the research in this field in recent years are summarized, and some of the ways to improve the friction performance of CVD diamond thin film from the perspective of reducing the friction coefficient are ana- lyzed.

关 键 词：金刚石薄膜 摩擦学性能 纳米金刚石薄膜 掺杂类金刚石薄膜 

分 类 号：TB43[一般工业技术]