电泳沉积法制备锶铁氧体厚膜  

Electrophoretic Deposition of Strontium Ferrite Thick Film

作　　者：王鹏[1] 李军科[1] 彭斌[1] 王渊朝[1] 

机构地区：[1]电子科技大学电子薄膜与集成器件国家重点实验室,成都610054

出　　处：《材料导报》2014年第4期11-14,18,共5页Materials Reports

基　　金：国防预研项目(51312060403);教育部支撑计划(62501036015)

摘　　要：通过表面活性剂十二烷基苯磺酸(DBSA)包覆锶铁氧体,在1-丁醇中制备了稳定的悬浮液并成功电泳沉积锶铁氧体厚膜。从理论和实验上研究了沉积量及膜厚与电场强度、电泳时间和电极距离等的关系。结果表明电泳法能够制备质量优异的锶铁氧体厚膜,但沉积条件对厚膜有重要影响。烧结温度为1000℃时可获得磁性能良好的厚膜,其比饱和磁化强度为45A·m2/kg,剩磁比为0.556,矫顽力为4840Oe。经过分步沉积膜厚可达40μm左右。利用该方法制备的膜可用于设计带宽较宽的非互易微波铁氧体器件。Stable strontium ferrite suspensions were obtained in 1-butanol by the addition of a surfactant dode- cylbenzene sulfonic acid （DBSA）, and then strontium ferrite thick films were successfully deposited. Experiments and theoretical consideration agrees on the relationship among the mass and thickness of the deposition, the electric field intensity, the electrophoresis time and the electrode distance. The results showed that electrophoretic deposition of strontium ferrite thick film is feasible. However, deposition conditions have important effects on the thickness of the film. Excellent properties of the thick film were obtained when the sintering temperature was 1000 ℃. Under this condition the saturation magnetization was 45 A·m2/kg with the coercivity 4840 Oe and the remanence ratio 0. 556. The thickness of film can reach 40μm when deposited step by step. The film can be potentially applied in wide band- width nonreciprocal microwave ferrite devices.

关 键 词：锶铁氧体薄膜 ZETA电位 电泳沉积 微波铁氧体器件 

分 类 号：O648.22[理学—物理化学]