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作 者:郑树文[1] 范广涵[1] 张涛[1] 皮辉[1] 俆开放
机构地区:[1]华南师范大学光电子材料与技术研究所,微纳光子功能材料与器件重点实验室,广州510631
出 处:《物理学报》2014年第8期367-376,共10页Acta Physica Sinica
基 金:国家自然科学基金(批准号:61176043);广东省战略性新兴产业专项资金(批准号:2012A080304016);华南师范大学青年教师培育基金(批准号:2012KJ018)资助的课题~~
摘 要:利用密度泛函理论的平面波超软赝势方法,对纤锌矿T M_(0.125)Zn_(0.875)O(TM=Be,Mg)合金和Ga掺杂T M_(0.125)Zn_(0.875)O的结构参数、能带、电子态密度和光学能隙进行计算和分析,结果表明:T M_(0.125)Zn_(0.875)O掺入Ga容易实现并且结构更稳定,T M_(0.125)Zn_(0.875)O合金掺Ga能获得很好的n型材料改性,能隙由导带底Ga 4s态和价带顶O 2p态决定,由于Bllrstein-Moss移动和多体效应,Ga掺杂后的T M_(0.125)Zn_(0.875)O光学能隙变大,这与实验结果相一致,T M_(0.125)Zn_(0.875)O掺Ga材料可作透明导电薄膜应用到紫外和深紫外光电子器件中。The optimized structure parameters, electron density of states, energy band structures and optical bandgaps of the T M0.125Zn0.875O (T M =Be, Mg) alloys and Ga-doped T M0.125Zn0.875O are calculated and analyzed by using the ultra-soft pseudopotential approach of the plane-wave based upon density functional theory. The theoretical results show the Ga-doped T M0.125Zn0.875O materials are easily obtained and their structures are more stable. The Ga-doped T M0.125Zn0.875O are good n-type materials and their energy bandgaps are determined by Ga 4s states of the conduction band minimum and O 2p states of the valence band maximum. Compared with the T M0.125Zn0.875O alloys, the optical bandgaps of Ga-doped T M0.125Zn0.875O become wider due to the Burstein-Moss shift and many-body effects, which is consistent with previous experimental data. The Ga-doped T M0.125Zn0.875O materials are suitable as TCO films for the UV and deep UV optoelectronic device.
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