5-氨基四氮唑存在下的锰电沉积行为  

Electrodeposition behavior of manganese in presence of 5-amino-1H-tetrazole

作　　者：刘伟[1] 陈上[1] 李长安[1] 丁其晨[1] 

机构地区：[1]吉首大学化学化工学院,吉首416000

出　　处：《中国有色金属学报》2014年第2期484-490,共7页The Chinese Journal of Nonferrous Metals

摘　　要：采用5-氨基四氮唑（AT）作为锰电沉积过程的新型添加剂,研究不同添加剂用量、电流密度、Mn2＋浓度、硫酸铵浓度等条件对锰电沉积电流效率的影响,以及添加剂存在下电解液中杂质离子对电沉积的影响。采用SEM观察了锰电沉积过程中的电极表面状态,采用线性电位扫描法研究添加剂对阴极电极过程的影响。结果表明：在添加剂AT用量0.07 g/L、电流密度460 A/m2、[Mn2＋]18 g/L以上、硫酸铵浓度100-120 g/L的电解条件下,锰沉积过程中电流效率可达72%以上,使用该添加剂容许电解液中有少量Fe、Co、Ni、Cu杂质离子存在。锰沉积过程中电流效率变化与电镜观察的锰成晶生长以及阴极板表面的粗糙程度具有相关性,添加剂AT通过对竞争析氢反应的抑制作用来提高锰沉积的电流效率。The 5-amino-1H-tetrazole （AT） was employed as a novel additive during electrodepositing of manganese. Effects of the amount of additive, current density, concentrations of Mn2＋and ammonium sulfate on the current efficiency of the electrodeposition were investigated, and the effect of impurity ions on electrodeposition was also examined. The surface morphology of electrode was examined by SEM. The effect of additive on cathode electrochemical behaviors was studied by linear sweep voltammetry （LSV）. The results indicate that the current efficiency can reach 72% under the following optimum conditions：AT content of 0.07 g/L, current density of 460 A/m2, [Mn2＋]＆gt;18 g/L, [（NH4）2SO4] of 100-120 g/L. A small amount of contaminating metal ions, such as Fe, Co, Ni and Cu, are allowed to present in electrolytic solution. The variation of current efficiency in electrodeposition correlates with the status of crystal growth and roughness of cathode. The increasement of current efficiency of electrodeposition can be attributed to the inhibition towards the reduction of hydrogen in the presence of AT.

关 键 词：锰 电沉积 添加剂 5-氨基四氮唑 

分 类 号：TF803.27[冶金工程—有色金属冶金]