晶体硅铸锭用氮化硅涂层失效机理及改性研究  

Invalidation mechanism and modification of Si_3N_4 coating for photovoltaic silicon ingot production

作　　者：周海萍[1] 尹长浩 黄新明[1,2] 

机构地区：[1]南京工业大学,江苏南京210009 [2]东海晶澳太阳能科技有限公司

出　　处：《无机盐工业》2014年第5期35-37,65,共4页Inorganic Chemicals Industry

摘　　要：氮化硅涂层是多晶硅铸锭必不可少的脱模剂,新型高效多晶硅铸锭对氮化硅涂层提出更高的要求。重点研究了氮化硅涂层在新型高效多晶硅铸锭过程中的失效机理,结果显示,氮化硅的碳化是导致氮化硅涂层与硅熔体间非浸润性降低,以及氮化硅涂层失效的主要原因。采用改进的溶胶-凝胶法(Sol-Gel)结合表面无碳处理制备增强型氮化硅涂层,该涂层在铸锭实验中显示出较高的强度及与硅熔体间良好的非浸润性,能够很好地满足新型高效多晶硅对氮化硅涂层的要求。As releasing agent,silicon nitride （Si3N4） coating is an indispensable material for photovohaic silicon ingot production. The purpose of this study is to propose a comprehensive understanding of the invalidation mechanism of the Si3N4 coating and to present an improved Si3N4 coating for the new-typed multi-crystalline silicon （mc-silicon） casting.It was found that the carbonization of the Si3N4 could be a main invalidation cause of the Si3N4 coating, as it led to decreasing of non-wettability between the coating and silicon melt.The reinforced Si3N4 coating prepared with improved sol-gel （SG） method and surface carbon-free treatment showed high adhesion strength and improved non-wettability,which could meet the demands of the new-typed mc-silicon casting very well. -

关 键 词：氮化硅涂层 失效 改性 

分 类 号：TQ126.72[化学工程—无机化工]