基于对数极坐标映射的非均匀透镜阵列设计  

Designing Non-uniform Lens Array Based on Log-polar Mapping

作　　者：曹杰[1] 郝群[1] 宋勇[1] 樊凡[1] 刘韬[1] 杨云翼[1] 高鸿勋 

机构地区：[1]北京理工大学光电学院,北京100081

出　　处：《光子学报》2014年第4期91-96,共6页Acta Photonica Sinica

基　　金：国防基础科研项目(No.A2220110005);上海航天科技创新基金(No.3040041110009)资助

摘　　要：提出了一种基于非均匀透镜阵列的对数极坐标传感器,通过建立数学模型,证明其具有非均匀采样与对数极坐标映射特性.通过仿真实验以及实例设计验证了模型的有效性,同时分析了非均匀透镜阵列的关键参量(盲孔半径r0,增长系数q,填充因子ηf)对系统性能的影响,结果表明:1)盲孔半径r0在每环透镜数量N相同的情况下,随着环数M的增加而减小;在M相同的情况下,随着N的增加而增大;2)填充因子ηf随N的增加而增加,当N≥40,ηf趋于极限值π/4,选取N=40,得到较为合理的环间增长系数q=1.106.所获得的实验结果为实现对数极坐标映射的非均匀透镜阵列设计奠定了理论基础,有利于实现一种新型对数极坐标图像传感器.A novel log-polar image sensor based on non-uniform lens array was proposed in this paper. Non-uniform sampling and log-polar mapping were testified by building mathematic model.The validity of the model was verified by some design examples.Meanwhile,some key parameters were analyzed and simulated,including blank spot radius（r0）,growth coefficient（q）and fill factor（ηf）.Several conclusions can be obtained from the simulation.r0 decreases with M on the condition that N is unchanged and increases with N on the condition that Mis unchanged.Meanwhile,ηfincreases with N and tends toπ/4if N≥40.So,appropriate growth coefficient（q=1.106）was obtained on the condition that N =40.The results from the simulation support theoretical foundation for realizing log-polar transformation of based on non-uniform lens array and useful to design a novel log-polar image sensor.

关 键 词：应用光学 非均匀透镜阵列 对数极坐标映射 非均匀采样 光学设计 数学模型 光学传感器 

分 类 号：TP391[自动化与计算机技术—计算机应用技术]