直流电弧等离子体球化U_3Si_2粉体  

U_3Si_2 Powder Sphericized by Direct Current Plasma

作　　者：孔常静[1] 宁伟建[1] 吴彬[1] 纪崇甲[1] 

机构地区：[1]中国科学院力学研究所,北京100081

出　　处：《中国粉体技术》2000年第4期44-46,共3页China Powder Science and Technology

摘　　要：研制了直流电弧等离子体球化U3 Si2 粉体装置。在Ar+He气氛下对粒度为 10～ 15 0 μm范围内不规则形状的U3 Si2 粉体进行了球化 ,球化率达 90 %。The equipment of sphericized U 3Si 2 powder by direct current arc plasma is fabricated.In Ar and He mixture plasma atmosphere,the spherical U 3Si 2 powder is produced from an irregular powder of 10～15μm.The result shows the conversion rate of the U 3Si 2 powder can reach 90%.

关 键 词：U3Si2粉体 等离子体 直流电弧 球化工艺 球状粉体 

分 类 号：TQ029[化学工程] TQ051.9