基片表面的倾斜度对光学势阱的影响  

Effect of substrate surface slope on optical potential

作　　者：张宝武[1] 支理想[1] 王道档[1,2] 

机构地区：[1]中国计量学院计量测试工程学院,杭州310018 [2]天津大学精密测试技术及仪器国家重点实验室,天津300072

出　　处：《激光技术》2014年第3期380-383,共4页Laser Technology

基　　金：国家自然科学基金资助项目(11064002);浙江省自然科学基金资助项目(LQ13F050002);广西省自然科学基金资助项目(2012gxnsfaa53229;2013GXNSFDA019 002);天津大学精密测试技术及仪器国家重点实验室开放基金资助项目;广西省自动检测技术与仪器重点实验室基金资助项目(YQ14206)

摘　　要：为了研究原子光刻实验中基片对汇聚激光场的影响,基于几何光学,采用数值仿真的方法,研究了基片表面的倾斜度对光学势阱的影响。结果表明,当基片表面相对于激光驻波中轴线正倾斜时,基片表面会形成一个无光场区,使光学势阱为0,且在z方向上光学势阱会发生一个零值突变;当基片表面相对于驻波中轴线负倾斜时,基片表面永远存在光场,在z方向上光学势阱不会发生零值突变,且光学势阱相对于z=0会出现对称现象。该研究结果对激光汇聚原子沉积实验具有指导意义。In order to study effect of substrate on the focusing laser field in atom lithograph , based on geometrical optics and numerical simulation , effects of substrate surface slope on optical potential were studied .The results indicate that when the substrate surface has positive slope related to the laser standing wave axis , there is an area without light illumination on the surface whose optical potential is zero , and the curve of optical potential in z direction will suddenly vanish;when the substrate surface has negative slope related to the laser standing wave axis , all the surface will be illuminated by the laser and the curve of optical potential in z direction will vary smoothly to zero , and the optical potential will be symmetric related to z=0.The results are useful for the experiment of laser-focusing atom deposition .

关 键 词：激光技术 激光驻波场 高斯激光 倾斜度 

分 类 号：O43[机械工程—光学工程]