磁控溅射法制备ZrMoN复合膜的显微结构和摩擦性能  

Microstructure and tribological properties of ZrMoN composite film fabricated by magnetron sputtering

作　　者：喻利花[1] 赵强[1] 许俊华[1] 

机构地区：[1]江苏科技大学材料科学与工程学院,镇江212003

出　　处：《粉末冶金材料科学与工程》2014年第1期77-82,共6页Materials Science and Engineering of Powder Metallurgy

基　　金：国家自然科学基金资助项目(51074080);江苏省自然科学基金资助项目(BK2008240)

摘　　要：采用磁控溅射法在单晶硅(100)和304不锈钢基底上沉积不同Mo含量的Zr1-xMoxN(x=0.05,0.14,0.42,0.52)复合膜,采用X射线衍射仪、纳米压痕仪(CSM)、摩擦磨损试验机、扫描电镜和能谱仪研究复合膜的显微结构、力学性能及摩擦性能。结果表明:Zr1-xMoxN复合膜以fcc(Zr,Mo)N结构为主,随x增大,薄膜中会出现fcc Mo2N相。复合膜的硬度从28.1 GPa(ZrN)增加至29.6 GPa(x=0.05),x继续增加,硬度逐渐降低。室温下,薄膜的摩擦因数由0.69(ZrN)降低至0.44(x=0.14),x继续增加摩擦因数略有增加。当温度高于100℃时,Zr0.58Mo0.42N复合膜的摩擦因数随温度升高先升高后降低,在300℃时达到最大。并讨论了ZrMoN复合膜Magnéli相的作用和自适应机制。Zr1-xMoxN （x=0.05, 0.14, 0.42, 0.52） composite films with different Mo content were deposited on wafers of silicon （100） and 304 stainless steel by magnetron sputtering technique. The microstructures, mechanical properties and friction properties of Zr1-xMo0.42N films were investigated by X-ray diffraction, nano-indentation CSM, high-temperature ball-on-disc tribo-meter and SEM-EDS analysis. The results show that Zr1-xMoxN composite films mainly exhibit fcc （Zr, Mo）N structure, fcc Mo2N phase appears in the film with the increase of x. The hardness of the film increases from 28.1 GPa （ZrN） to 29.6 GPa （x=0.05）, the hardness gradually decreases with x continues to increase. At room temperature, friction coefficient of ZrMoN composite films reduces from 0.69 （ZrN） to 0.44 （x=0.14）, with x continues to increase, the friction coefficient increases slightly. The friction coefficient of Zr0.58Mo0.42N composites film increases and then decreases with the increase of temperature when the temperature is over 100 ℃ , the friction coefficient reaches a maximum value at 300 ℃,with the temperature continues to increase the friction coefficient decreases gradually. The effect and self-adaptive mechanisms of Magnéli phase in the ZrMoN films are also discussed.

关 键 词：ZrMoN复合膜 显微结构 力学性能 摩擦性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理]