Room-Temperature Operation of 2.4 μm InGaAsSb/A1GaAsSb Quantum-Well Laser Diodes with Low-Threshold Current Density  被引量:10

Room-Temperature Operation of 2.4 μm InGaAsSb/A1GaAsSb Quantum-Well Laser Diodes with Low-Threshold Current Density

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作  者:邢军亮 张宇 廖永平 王娟 向伟 徐应强 王国伟 任正伟 牛智川 

机构地区:[1]State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083

出  处:《Chinese Physics Letters》2014年第5期69-71,共3页中国物理快报(英文版)

基  金:Supported by the National Basic Research Program of China under Grant Nos 2013CB932904, 2012CB932701, 2011CB922201 and 2010CB327600, the National Special Funds for the Development of Major Research Equipment and Instruments under Grant No 2012YQ140005, and the National Natural Science Foundation of China under Grant Nos 61274013, U1037602 and 61290303.

摘  要:GaSb-based 2.4μm InGaAsSb/AIGaAsSb type-I quantum-well laser diode is fabricated. The laser is designed consisting of three In0.35 Ga0.65As0.1Sb0.9/Al0.35 Ga0.65 As0.02Sb0.98 quantum wells with 1% compressive strain located in the central part of an undoped Al0.35Ga0.65As0.02Sb0.98 waveguide layer. The output power of the laser with a 50-μm-wide i-ram-long cavity is 28roW, and the threshold current density is 400A/cm2 under continuous wave operation mode at room temperature.GaSb-based 2.4μm InGaAsSb/AIGaAsSb type-I quantum-well laser diode is fabricated. The laser is designed consisting of three In0.35 Ga0.65As0.1Sb0.9/Al0.35 Ga0.65 As0.02Sb0.98 quantum wells with 1% compressive strain located in the central part of an undoped Al0.35Ga0.65As0.02Sb0.98 waveguide layer. The output power of the laser with a 50-μm-wide i-ram-long cavity is 28roW, and the threshold current density is 400A/cm2 under continuous wave operation mode at room temperature.

分 类 号:TN248.4[电子电信—物理电子学] TN248.1

 

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