活性填料钽在聚碳硅烷转化陶瓷中的应用  

Application of Tantalum in the Preparation of Polycarbosilane Derived Ceramics

作　　者：谢征芳[1] 陈朝辉[1] 李永清[1] 郑文伟[1] 胡海峰[1] 肖加余[1] 

机构地区：[1]国防科技大学航天与材料工程学院,长沙410073

出　　处：《材料工程》2000年第9期7-10,共4页Journal of Materials Engineering

基　　金：国家自然科学基金!资助项目 ( 5 9682 0 0 9)

摘　　要：研究了活性填料钽 (Ta)在聚碳硅烷 (PCS)先驱体转化陶瓷中的应用。研究表明 ,活性填料 Ta能有效降低陶瓷素坯的气孔率。Ta可与 PCS气态裂解产物和 N2 气氛反应生成新的化合物 ,提高 PCS的陶瓷产率。Ta还能提高烧成体的强度。但是 Ta的引入并不能抑制坯体在裂解过程中的收缩。Ta含量越高 ,陶瓷烧成体的线收缩越大。The application of tantalum in the preparation of polycarbosilane derived ceramics was investigated The results show that Ta can decrease the porosity of the green compact and, since Ta could react with gas volatile of PCS during pyrolysis and/or free carbon to produce carbide and N 2 to produce nitride, increase the ceramic yield of PCS However, Ta can not restrain the linear shrinkage of the green compact upon pyrolysis The linear shrinkage is increased with increasing the volume ratio of ψ(Ta∶PCS)

关 键 词：活性填料 聚碳硅烷 碳化硅陶瓷 先驱体转化 

分 类 号：TQ174.758[化学工程—陶瓷工业]