端面金属化陶瓷真空管的制备方法与发展方向  

Processing methods and development direction of ceramic vacuum tube with metallized end face

作　　者：陈海芹[1] 刘敏[1] 赵鑫[1] 乔凯明[1] 扈春鹤 刘雪峰[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083 [2]国家知识产权局专利局专利审查协作北京中心,北京100083

出　　处：《真空》2014年第3期26-29,共4页Vacuum

基　　金：国家863计划资助项目(2012AA030302)

摘　　要：介绍了陶瓷真空管的主要用途,重点对实现陶瓷真空管端面金属化的真空离子镀、真空蒸镀、磁控溅射、烧结被金属、烧结金属粉末以及均匀沉淀、电镀、化学镀等制备方法进行了综述,提出了光催化化学镀实现陶瓷真空管端面金属化的制备新方法,并对端面金属化陶瓷真空管的发展方向进行了思考。The applications of ceramic vacuum tube were introduced. The common processing methods to metallize the end face of ceramic vacuum tube, such as ion plating, vacuum evaporation, magnetron sputtering, metal firing spreading, metal power sintering, homogeneous precipitation process, electroplating and electroless plating, were reviewed and a new processing method, photocatalytic electroless plating, was proposed. In addition, the development direction of ceramic vacuum tube with metallized end face was studied at the end of this paper.

关 键 词：陶瓷真空管 端面金属化 制备方法 发展方向 

分 类 号：TB74[一般工业技术—材料科学与工程]