Fe^+与Ti^+注入对杉木苗高及相对电导率的影响  

A Comparative Study of Fe^+ and Ti^+ Ion Implantation on Seedling Height and Relative Conductivity of Chinese Fir

作　　者：郝杰[1] 阮少宁[1] 林思祖[1] 张涛[2] 薛明瑜 

机构地区：[1]福建农林大学杉木工程技术研究中心,福建福州350002 [2]北京师范大学核科学与技术学院,北京100000

出　　处：《泉州师范学院学报》2014年第2期13-16,共4页Journal of Quanzhou Normal University

基　　金：福建省自然科学基金资助项目(26121065)

摘　　要：研究比较不同离子注入对杉木生长差异,为离子注入技术在杉木育种上的研究提供参考依据.以能量50keV,不同剂量Fe+及Ti+注入杉木种子,观察注入后其对杉木幼苗苗高及相对电导率影响.Fe+及Ti+注入对苗高长生均呈波动上升趋势,Fe+D4剂量对苗高促进作用较强,Ti+D3剂量对苗高促进作用较好,随着幼苗的生长,苗高增幅之差表现出下降的趋势.Fe+及Ti+注入处理组的电导率均表现出先上升后下降的趋势,电导率在D3剂量时都上升达到最高点,分别上升了9.5%和4.8%;同剂量下Fe+的上升幅度均大于Ti+,对电导率的影响更显著.Fe+及Ti+对幼苗的苗高具有促进作用,并随注入剂量升高促进作用有越强的趋势;Ti+注入相比Fe+注入,对细胞膜造成损伤程度低.This paper studies the growth that varied significantly of Chinese fir comparison different ion implantation for ion implantation studies on Chinese fir breeding technology to provide reference. Under energy of 50 keV, Fe^＋ and Ti^＋ , different dose injection to the fir seeds observe fir seedling height and relative conductivity index changes. Fe＋ and Ti＋ injection have the trend of rising on seedling height,Fe^＋D4 doses of injected on the seedling height promote even more sharply, Ti^＋ D3 doses of injected have better effect to promote the seedling height, and to promote the implantation dose increases with the stronger tendency, However, no obvious significant . with the growth of seedlings, seedling height increment showed a downward trend. Relative conductivity all offered upgrade firstly than descending latter tendency. The conductivity is increased to the highest dose D3 point,increasing 9.5% and 4.8%.Rise of Fe^＋ ions with a dose greater than Ti^＋ ions,more significant to the influence of the conductivity. Fe^＋ and Ti^＋ injection have certain stimulating function for its height,Ti ion implantation compared to the Fe ions ,resulting in low levels of cell membrane damage.

关 键 词：杉木 离子束注入 苗高 相对电导率 

分 类 号：S791.27[农业科学—林木遗传育种]