ICP-AES法测定高钒铁中杂质元素  

Determination of Impurity Element in High Ferrovanadium by Inductively Coupled Plasma-Atomic Emission Spectrometry

作　　者：刘爱坤[1] 

机构地区：[1]山西太钢不锈钢股份有限公司技术中心,山西太原050005

出　　处：《现代科学仪器》2014年第2期138-140,共3页Modern Scientific Instruments

摘　　要：提出了ICP-AES法（电感耦合等离子体原子发射光谱法）测定高钒铁中硅、锰、磷和铝等杂质元素的分析方法。研究了基体元素及共存元素的光谱干扰情况,选择出最佳的分析谱线;优化了仪器工作条件,测定了元素的检出限、测定下限,进行了精密度和准确度试验。按所提出方法测定了样品11次,各元素测定值的相对标准偏差〈4%,加标回收率在98.5%~103%之间。A method for simultaneous determination of impurity Element in high Ferrovanadium was studied.The analytical spectral lines and determination conditions were optimized.The detection limits and determination low limits of the method were achieved.The precision and accuracy of method were tested.The relative standard deviation（n=l 1）is less than 4%,The recovery rates are in range of 98.5%-103%.The method is simple and Rapid.

关 键 词：ICP-AES法 高钒铁 杂质元素 

分 类 号：TH744.11[机械工程—光学工程]