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作 者:陈虎[1]
机构地区:[1]中国工程物理研究院电子工程研究所,四川绵阳621900
出 处:《电镀与精饰》2014年第5期37-40,共4页Plating & Finishing
摘 要:利用电化学方法采用线性伏安扫描、循环伏安和电化学阻抗测试研究了HR-1不锈钢在硫酸-磷酸溶液中的电化学抛光行为.实验结果表明,实验所得阳极极化曲线与理论阳极极化曲线吻合较好,证明了在抛光过程中钝化膜的存在,钝化膜形成的电压为0.75~1.25V,最佳的抛光电压区域为1.25~1.75V.通过分析研究,对优化电化学抛光参数,更好的将电化学抛光技术应用于实际生产具有指导意义.Electrochemical polishing behaviour of HR-1 stainless steel in sulfuric-phosphoric mixed acid was studied by linear voltammetry, cyclic vohammetry and electrochemical impedance. Curves obtained from the experiments were coincident with the theoretical curves and proved the existence of passive film by analyzing data of the experiments. Voltage range of the passive film formation was 0. 75 - 1.25V ( vs. SCE) , and the ideal electrochemical polishing voltage range was 1.25 -1.75V (vs. SCE). It is effective to optimize the electrochemical polishing parameters by electrochemical technique, and this would make the electrochemical polishing more available in practical production.
分 类 号:TQ153.5[化学工程—电化学工业]
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