磁场条件下化学镀镍薄膜制备及磁性能研究  

Preparation and Magnetic Properties of the Ni Films Prepared by Electroless Plating under Magnetic Field Condition

作　　者：刘洋[1] 王丹洁[1] 寿容儿 张红星[1] 余云丹[1] 卫国英[1] 葛洪良[1] 孙丽侠[1] 

机构地区：[1]中国计量学院材料科学与工程学院,浙江杭州310018

出　　处：《电镀与精饰》2014年第5期41-43,共3页Plating & Finishing

基　　金：浙江省自然科学基金(LQ12E01007);国家国际合作项目(2011DFA52400)

摘　　要：利用化学镀方法,在没有外磁场和施加弱磁场条件下制备了磁性镍薄膜。薄膜均具有银色金属光泽,表面平整致密。X-射线衍射仪分析表明,弱磁场下制得的薄膜中镍晶粒的取向排列性较强。扫描电子显微镜观察可知,未加磁场制备的镍膜是由粒径200nm的镍纳米颗粒在基底上沉积组成的。在磁场条件下制备的镍膜是由数十微米长的镍纳米线在基底上有序排列组成。磁测量结果表明,磁场条件下制备的镍膜的磁性能有显著改变,原因是由膜层特殊的磁畴结构造成的。Magnetic nickel films were prepared by electroless plating method under conditions of no exter- nal magnetic filed applied and a weak magnetic field applied respectively. The films had silver metallic luster and smooth and dense surface. X-ray diffraction analysis showed that the grain orientation arrange- ment of the films prepared under weak magnetic field condition were stronger. Scanning electron microsco- py showed that nickel films prepared under no magnetic field condition were formed by deposition of 200nm diameter nickel nano-particles on substrate;nickel films prepared under magnetic field condition were formed by orderly arrangement of tens of microns long nickel nano-wires on substrate. Magnetic measurements indicated that magnetic properties of the nickel films prepared under magnetic field condi- tion had changed significantly because of special magnetic domain structure of the films.

关 键 词：化学镀 磁场 镍薄膜 形貌 磁性能 

分 类 号：TQ153.12[化学工程—电化学工业]