等离子喷涂Cr_2O_3涂层显微硬度的工艺优化  

PROCESS OPTIMIZATION OF MICROHARDNESS OF PLASMA SPRAYED Cr_2O_3 COATING

作　　者：李剑锋[1] 黄静琪[1] 季珩[1] 丁传贤[1] 

机构地区：[1]中国科学院上海硅酸盐研究所,上海200050

出　　处：《硅酸盐学报》2001年第1期49-53,共5页Journal of The Chinese Ceramic Society

摘　　要：应用均匀设计实验方法和对测量数据的统计分析结果 ,系统地考察了喷枪电流、等离子气体流量、喷涂距离和送粉率等工艺参数对Cr2 O3涂层显微硬度的影响 ,并运用逐步回归分析建立显微硬度随所考察工艺参数变化的数学模型 ;然后以所建立的数学模型为基础 ,对Cr2 O3涂层显微硬度进行了工艺优化 .结果表明 :以优化工艺参数喷涂涂层的显微硬度与数学模型预测的最优值相当一致 ,均匀设计法可用于等离子喷涂涂层显微硬度的工艺优化 .The effects of the power level, plasma gas flow, spraying distance and powder feed rate on the microhardness of plasma sprayed Cr2O3 coatings were investigated by using uniform design experiment method and statistical analysis of measured data series. The stepwise regression was employed to establish a mathematical model of the relationship between the microhardness and the process parameters. Based on the mathematical model, the microhardness of the plasma sprayed coating is optimized with respect to the investigated process parameters. Results show that the microhardness of the coating obtained by using the optimized process parameters agree very well with the predicted value by the mathematical model.

关 键 词：等离子喷涂 均匀设计 氧化铬涂层 显微硬度 工艺优化 

分 类 号：TG174.442[金属学及工艺—金属表面处理] TG174.453[金属学及工艺—金属学]