化学镀Ni-P合金镀层的微观结构  

Microstructure of Electroless Plated Ni-P Alloy Deposit

作　　者：周上祺[1] 陈青[1] 任勤[1] 

机构地区：[1]重庆大学材料科学与工程学院,400044

出　　处：《材料保护》2001年第2期10-12,共3页Materials Protection

摘　　要：用X射线衍射仪和透射电镜研究了化学镀Ni P合金镀层的微观结构 ,提出了镀层结构模型 ,分析了镀层生成的结晶机理 ,比较了化学镀低磷与高磷Ni P合金的晶体结构区别 :前者为致密的镍基相中弥散分布粒状Ni3P相的晶体结构 ,后者为几何形状不规则的非晶态结构。对非晶态组织在 30 0℃和 4 0 0℃进行热处理 ,合金镀层发生晶化转变 。The microstructure of electroless plated Ni-P alloy deposit(heat treated at 200℃300℃,400℃)was studied by XRD and TEM.Comparisons were made on the structures of low and high phosphor contained Ni-P alloys,the former was in crystalline nickel phase with dispersed Ni\-3P and the later was in irregular amorphous structure.A microstructural model of the deposit was suggested.

关 键 词：化学镀 镍磷合金 镀层结构 镀层 

分 类 号：TB304[一般工业技术—材料科学与工程]