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机构地区:[1]同济大学环境科学与工程学院,污染控制与资源化研究国家重点实验室,上海200092
出 处:《中国环境科学》2014年第6期1442-1447,共6页China Environmental Science
基 金:国家自然科学基金资助项目(51378368)
摘 要:利用连续搅拌氢基质生物膜反应器研究氢气(H2)分压,NO3^--N,SO4^2-,SeO4^2-进水浓度对水中硒酸盐去除效果的影响.结果表明,H2分压是水中氧化态污染物NO3^-,SO4^2-,SeO4^2-去除效果的重要影响因素,随着H2分压从0.02MPa上升到0.08MPa,SO4^2-的去除率从3.5%上升到46.3%,总Se的去除率从60.7%上升到82.1%,NO3^-全过程都完全被还原为N2;随着NO3^--N进水浓度从5mg/L增加到50mg/L,SO4^2-,SeO4^2-的去除率逐渐下降至0,并出现NO2-的积累;SO4^2-进水浓度的增加对NO3^-,SeO4^2-去除效果影响不大,去除率分别保持在99.5%和65%以上,三种氧化态污染物得电子的优先级为NO3^-〉SeO4^2-〉SO4^2-.在NO3^--N浓度为10mg/L,SO4^2-浓度为25mg/L的水质条件下,反应器设置H2分压为0.04MPa,进水Se(VI)浓度在0.25~2mg/L的范围内总Se可以取得80%以上的去除效果.A continuous stirred hydrogen-based membrane biofilm reactor(CS-MBfR) was used to investigate the effects of the H2 pressure and the influent concentrations of NO3^-, SO4^2- and SeO4^2- on the removal of SeO4^2- from aqueous solution. As the experiment results showed, H2 pressure was a key factor influencing the removal of NO3^-, SO4^2- and SeO4^2-. With the increase of H2pressure from 0.02MPa to 0.08MPa, the removal rates of SO4^2- and total Se increased from 3.5% and 60.7% to 46.3% and 2.1%, respectively, while NO3^- was completely reduced to N2 throughout the process. When influent NO3^- concentration increased from 5 to 50mg/L, the removal rates of SO4^2- and SeO4^2- gradually decreased to 0, and the NO2- accumulation was observed. The removal of NO3^- and SeO4^2- was not affected by increasing influent SO4^2- concentration, and their removal rates were above 99.5% and 65%, respectively. The priority sequence of electron accepting ability is NO3^-〉SeO4^2-〉SO4^2-. Under the conditions of H2 pressure 0.04MPa, NO3^- 10mg/L, SO4^2- 25mg/L, and Se(VI) 0.25~2mg/L, the removal rate of total Se was above 80%.
分 类 号:X505[环境科学与工程—环境工程]
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