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机构地区:[1]厦门理工学院材料科学与工程学院,厦门361024 [2]华侨大学材料科学与工程学院,厦门361021
出 处:《分析试验室》2014年第7期855-859,共5页Chinese Journal of Analysis Laboratory
摘 要:用电感耦合等离子体原子发射光谱仪(ICP-AES)测定太阳能级硅(SOG-Si)中磷等12种杂质元素。实验发现,在150℃时,用HF和HNO3的混合溶液,试样在PFA烧杯中能较快溶解。在1000级洁净室中,用金属氧化物半导体(MOS)级试剂溶解电子级硅(EG-Si,纯度大于9N)可控制样品空白中各元素的含量均小于1μg/L,并能较好的补偿基体效应。在选定仪器工作条件下,被测元素检出限为5~50 ng/mL,回收率在93%~105%,相对标准偏差RSD≤9.8%(n=11)。测定结果与电感耦合等离子体原子发射质谱(ICP-MS)法及辉光放电质谱(GDMS)法进行了比对,结果吻合。The 12 trace impure elements of P etc in solar grade silicon(SOG-Si) were determined by inductively coupled plasma atomic emission spectrometry(ICP-AES) in this paper.The silicon sample was dissolved in nitric acid and hydrofluoric acid under heated in PFA container at about 150 ℃.EG-Si was dissolved by reagent of metal oxide semiconductor(MOS) level in class 1000 clean room,so the impurities in sample blank was less than 1 μg/L and the silicon matrix effect can be partly reduced.Under the optimal conditions of instrument,the detection limits of method were from 5 to 50 ng/mL(3() and the recoveries were 93% ~105% with the relative standard deviation(RSD) of no more than 9.8%(n =11).The found results were consistent with those obtained by inductively coupled plasma mass spectrometry(ICP-MS) and glow discharge mass spectrometry(GDMS).
关 键 词:电感耦合等离子体原子发射光谱仪 太阳能级硅 洁净室 杂质元素
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