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机构地区:[1]上海海事大学商船学院,上海201306 [2]大连海事大学轮机工程学院,大连116026
出 处:《高电压技术》2014年第6期1756-1761,共6页High Voltage Engineering
基 金:国家高技术研究发展计划(863计划)(2012AA062609);国际科技合作项目(2010DFA61470)~~
摘 要:等离子体天线激励源的频率较高时,电磁干扰更加严重,电磁兼容性问题亟待解决。借助场强仪、频谱仪及光谱仪等相关仪器,实验研究了在40.68 MHz激励条件下等离子体天线的电磁兼容性,并同直流、低频交流激励模式下的等离子体天线进行了比较。结果发现,等离子体本身可以产生感应场,场强随电子密度的增大而增大,但一般≤3 V/m,仅通过增大距离便可消除。40.68 MHz交流激励源辐射干扰功率高于直流、低频交流激励源近50 dB。同时谐波的干扰也非常大,最强谐波干扰为激励信号干扰的10-3倍。以光谱仪作为敏感设备,发现高频交流源导致了光谱仪的输出光谱严重频移。通过设计滤波器、屏蔽的办法可大幅度减小激励源的辐射干扰,提高天线的电磁兼容性。The power supply of AC plasma antenna induces more severe electromagnetic interference(EMI) if its frequency increases. To solve this problem of electromagnetic compatibility(EMC), we experimentally investigated the EMC of a plasma antenna system driven by a 40.68 MHz AC plasma power supply, using field intensity meter and spectrum analyzer. The results are compared with those of other plasma antennas driven by DC power supplies and low-frequency AC power supplies. It is obtained that the plasma itself generates induction field, which intensifies with the increase of the electron density. However, the increase in intensity is not higher than 3 V / m, and it can be weakened by enlarging the distance. The 40.68 MHz power supply generates larger radiation interference than the DC and low-frequency AC ones by about 50 dB, moreover, it generates strong interference of harmonics, which reaches up to 10-3of the power supply interference. The output spectra of the spectrometer which is taken as sensitive equipment shift seriously by the high-frequency AC power supply. Nevertheless, we can improve the EMC of the plasma antenna by filtering and shielding, which reduce the radiation of the power supply largely.
分 类 号:TN820[电子电信—信息与通信工程]
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