邻磺酰苯酰胺对镍电沉积过程电化学行为研究  

Study on Electrochemistry Behavior of Saccharin on Nickel Electrodeposition

作　　者：许娜[1] 和晓才[1] 于占良 黄卉[2] 陈家辉[1] 

机构地区：[1]昆明冶金研究院,云南昆明650031 [2]昆明冶金高等专科学校,云南昆明650033

出　　处：《云南冶金》2014年第3期34-37,共4页Yunnan Metallurgy

摘　　要：利用交流阻抗法,研究了电沉积镍添加邻磺酰苯酰胺前后的交流阻抗图谱的变化趋势。通过ZsimpWin软件对Nyquist图进行拟合,得到电沉积镍的等效电路图。判断邻磺酰苯酰胺在电沉积镍过程中的电化学机理,随着添加量的增加电荷传递电阻也随之增加,阴极极化增大。The characteristics of electrochemical impedance spectroscopy for nickel electrodeposition with or without additive saccharin were studied. The equivalent circuit diagram of nickel electrodeposition can be obtained by matching of Nyquist diagram with ZsimpWin software. The results indicated that the electrochemistry mechanism of saccharin in nickel electrodeposition is that the cathodic polarization and electrochemical reaction resistance can be increased along with the increasing of the additive amount.

关 键 词：电沉积 阴极极化 交流阻抗 邻磺酰苯酰胺 

分 类 号：TF803.27[冶金工程—有色金属冶金]