透射电镜像转角的测定及应用  

Determination and Application of Image-Diffraction Pattern Rotation Angles in Transmission Electron Microscope

作　　者：雷运涛[1] 吴杏芳[2] 韩顺昌[1] 

机构地区：[1]洛阳船舶材料研究所,河南洛阳471039 [2]北京科技大学材料物理系,北京100083

出　　处：《分析测试学报》2000年第5期27-30,共4页Journal of Instrumental Analysis

摘　　要：论述了完全标定透射电镜像转角所需拍摄的二次曝光电子显微像的数量 ,推导了由已测的像转角间接计算其它像转角的一般公式。以PhilipsCM200电镜为实例 ,说明了测定像转角的基本步骤 ,并以实例说明怎样利用像转角 ,把衍射花样的晶体学信息传递给电子显微像。The amount of double exposed micrographs needed to completely calibrate a transmission electron microscope was discussed, and a formula for calculating other image _ diffraction pattern rotation angles from those already measured was deduced. The procedure for determining the rotation angles was illustrated using Philiphs CM200 as an example. An instance was given to show how to transfer the crystallographic information from an electron diffraction pattern to a micrograph.

关 键 词：透射电子显微镜 标定 像转角 二次曝光技术 

分 类 号：TN16[电子电信—物理电子学]