二甲基亚砜中电沉积钬钴合金的研究  

Study on Electrodeposition of Ho-Co Alloy from DMSO Bath

作　　者：王宇[1] 刘冠昆[1] 童叶翔[1] 

机构地区：[1]中山大学化学与化学工程学院,广东广州510275

出　　处：《中国稀土学报》2001年第1期54-57,共4页Journal of the Chinese Society of Rare Earths

基　　金：广东省自然科学基金!资助项目 (96 0 0 0 2 )

摘　　要：研究了在二甲基亚砜中钬与钴的电解共沉积。测定循环伏安曲线获知钬钴共沉积的沉积电位较钴单独析出为负而较钬的析出为正 ,属于诱导共沉积类型。恒电位电解表明在一定浓度范围内电位是影响合金成分的主要因素 ,而镀液组成的影响较小。在 -1 8V下恒电位电解得到了均匀、致密的非晶态合金沉积层。Codeposition of Ho with Co was studied in dimethysulfoxide (DMSO) by cyclic voltammetry and potentiostatic deposition at room temperature. The cyclic voltammogram shows that the codeposition of Ho with Co belongs to induced codeposition mechanism, and the codeposition potential of Ho and Co is more negative than that of Co but positive than that of Ho. When potentiostatic deposition is used to prepare Ho Co alloys, the results indicate that in the range of certain concentration potential is the main factor deciding the composition of Ho in Ho Co alloys, while the compositions of Ho 3+ and Co 2+ in electrolyte solution have less influence. According to the analysis of X ray diffraction, EDAX, and scanning electron microscopy, uniform, compact and amorphous film on Cu was obtained in 0 165 mol·L -1 Ho(NO 3) -0 135 mol·L -1 CoCl 2 DMSO solution at -1 8 V (vs.SCE).

关 键 词：诱导共沉积 恒电位电解 钬钴合金 二甲基亚砜 非晶态合金镀层 

分 类 号：TQ153.2[化学工程—电化学工业]