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作 者:陈霖[1] 杨新林[1] 彭鲲鹏[1] 程福永[1] 朱鹤孙[1]
机构地区:[1]北京理工大学材料科学研究中心,北京100081
出 处:《高技术通讯》2001年第2期17-20,共4页Chinese High Technology Letters
基 金:国家自然科学基金资助项目!(5 970 2 0 0 9)
摘 要:用激光共聚焦扫描显微镜研究了在低功率 (≤ 1mW )激光下水溶性C60 丙二酸衍生物 (DMAC60 )对HeLa细胞细胞膜的光诱导损伤及该过程中细胞内钙离子浓度( [Ca2 +]i)的变化。发现DMAC60 对HeLa细胞细胞膜的光诱导损伤过程在低浓度下 (≥1μM )即可发生 ,而且有浓度依赖性。值得注意的是 ,实验发现在膜损伤发生前伴随细胞内钙离子浓度的瞬时性升高。这些结果直接证实细胞膜是C60 衍生物的光敏作用靶点 。By using confocal laser scanning microscope, the photo induced damage to cell membrane of HeLa cells by dimalonic acid C 60 (DMA C 60 ) was investigated in the presence of low powerful laser source (P≤1mW), as well as the change of intracellular calcium concentration during the damage. The data showed that the photo induced toxicity against cell membrane activity occurred even at the presence of low concentration of DMA C 60 (≥1μ mol/L), and the damage was dose dependent. Furthermore, it was found that the transient increase of intracellular calcium concentration took place before the damage of cell membrane. These results demonstrated that cell membrane was a target of photosensitive action produced by C 60 derivative, and implied that calcium signaling was probably involved in the photosensitive action.
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