RIBLL大面积真空镀膜装置  

A large area Mylar foil vacuum silver plated equipment of RIBLL

作　　者：王猛[1] 陈志强[1] 詹文龙[1] 郭忠言[1] 肖国青[1] 王金川[1] 王全进[1] 李加兴[1] 宁振江[1] 王建松[1] 王建峰[1] 王贵文[1] 周嗣信[1] 

机构地区：[1]中国科学院近代物理研究所,兰州730000

出　　处：《核电子学与探测技术》2001年第1期51-55,共5页Nuclear Electronics & Detection Technology

基　　金：国家自然科学基金资助!( 10 0 2 196750 55;110 2 197350 10 )

摘　　要：描述了一台大面积双叠层阳极在 X、Y方向分条读出气体电离室而发展的大面积真空镀膜装置。镀膜腔体内体积为 990 mm× 780 mm× 780 mm。可镀膜面积最大为 960 mm× 750 mm。用该装置为RIBLL电离室镀阴极、X阳极、Y阳极和窗 ,镀膜面积 4 4 0 mm× 160 mm,Mylar膜厚 3.2 6μm,镀银 97.2 7nm,镀银厚度不均匀度为 18.91%。用它制作的 RIBLL电离室的阳极、阴极 ,当电离室工作气压2 5k Pa P10气体 ,阳极电压 2 2 0 V,阴极电压 - 160 0 V时 ,对 5.15Me Vα源测量能量分辨率为 4 .2 %。A large area vacuum silver plated equipment is described. It was steup in constructing two fold ionizing chamber with anodes tripped readout of RIBLL. The dimension of vacuum chamber is 990mm×780mm ×780mm. The maximun area of Mylar foil plated is about 960mm×750mm. The cathode, anodes tipped and windows of two fold IC had been plated with Ag in this equipment, The area of Mylar foils are 440mm×160mm. Thickness of Mylar is 3.26μm and thickness of Ag plated is 97.27nm in average. The relative dispersion of thickness in the siver plated is 18.91%. The IC with cathode and anodes tripped Ag plated of RIBLL was measured. When the pressure of P10 operating gas is 25kPa ,the cathode is set at -1600V and the anodes are at 200V, the energy resolution 4.2% for 5. 15MeV α particle is obtained.

关 键 词：双叠层阳极电离室 分条阳极 厚度不均匀度 真空镀膜装置 兰州放射性离子束流线 

分 类 号：TB79[一般工业技术—真空技术] TL811.1[核科学技术—核技术及应用]