100keV,20mA多磁极会切场离子源的研制与调试  

DEVELOPMENT AND ADJUSTMENT OF A lOOkeV 20mA ION SOURCE WITH MULTI-MAGNETIC POLE CUSP FIELD

作　　者：钟溥[1] 刘明哲[1] 陶士惠 陈栞 张开文 饶绍英 

机构地区：[1]核工业西南物理研究院

出　　处：《核聚变与等离子体物理》1991年第2期116-119,128,共5页Nuclear Fusion and Plasma Physics

摘　　要：一、引 言 在科学技术领域中,离子源的应用越来越广泛,形成了一门独立的学科——离子应用科学。尤其是70年代以来由于离子注入技术应用到材料表面改性的研究取得进展,从而使离子注入技术得到发展。 离子注入材料表面改性是一门新技术,它的优点是离子注入不通过加热形成特定的原子混合,又能快速引入晶格缺陷,从而改变金属的微观结构及相成分,最后导致金属宏观性质的改变。The development of an ion source with multi-magnetic pole cusp field for a three beam synchronous implanter is described together with its features and some engineering problems.The variations of arc current with arc voltage and extraction beam current with extraction voltage as well as the radial profile of the beam were measured. The results of adjustment show that under the condition of a chamber vacuum of 3×10-3Pa, ion beam energy of 100keV and discharge current of 10A, at a target of 150mm in diameter and 1.3m from the extraction apertures, the measured nitrogen ion current is 20mA, beam current density is 112mA·cm-2 and beam uniformity ±20%.

关 键 词：会切场 离子源 多磁极 

分 类 号：TL629.1[核科学技术—核技术及应用]