低辐射薄膜TiO_2-Ag-TiO_2-SiO的纳米尺度显微结构  

MICROSTRUCTURE STUDIES OF TiO_2-Ag-TiO_2-SiO LOW-EMISSIVITY FILMS AT NANOMETER SCALE

作　　者：詹倩[1] 于荣[1] 贺连龙[1] 李斗星[1] 郭晓楠[2] 

机构地区：[1]中国科学院金属研究所固体原子像开放研究实验室,沈阳110016 [2]上海交通大学材料学院,上海200030

出　　处：《金属学报》2001年第4期337-339,共3页Acta Metallurgica Sinica

基　　金：国家自然科学基金50071063;国家自然科学基金59831020资助项目

摘　　要：成功地制备了 ＴｉＯ２－Ａｇ－ＴｉＯ２－ＳｉＯ超薄多层膜的截面样品，并对其微观结构进行 ＴＥＭ， ＨＲＥＭ及纳米束 ＥＤＳ分析结果表明，薄膜各层厚度均匀，界面明锐、光滑 Ａｇ层由纳米晶组成，而 ＴｉＯ２和 ＳｉＯ层为非晶 Ａｇ在膜层中没有扩散或聚团。The cross-sectional samples of TiO2-Ag-TiO2-SiO multilayer films are prepared and their microstructures are studied by TEM, HREM and nanobeam EDS analysis. The results show that the thickness of every layer is uniform and the interface is sharp and smooth. The Ag layer is nanocrystal while TiO2 and SiO are amorphous. Nanometer-beam EDS, analysis demonstrated that diffusion of Ag did not occur, which is a strong factor to ensure the whole film's properties.

关 键 词：低辐射薄膜 微观结构 HREM 纳米束分析 

分 类 号：O484.1[理学—固体物理]