半导体材料与器件生产工艺尾气中砷、磷、硫的治理及检测  

Abatement and Detection of Arsenic,Phosphoric and Sulphuric Pollution during Semiconductor Material and Device Processes

作　　者：闻瑞梅[1] 梁骏吾[1] 邓礼生[1] 彭永清[1] 

机构地区：[1]中国科学院半导体研究所

出　　处：《Journal of Semiconductors》1995年第3期188-194,共7页半导体学报（英文版）

摘　　要：本文研究了化合物半导体材料、器件生产工艺过程中排出的有毒物质砷、磷、硫及其化合物的治理方法．还研究了这些有毒物质的低温富集取样及快速、灵敏的分析监测方法，并与其它经典的方法作了对比．Abstract The. abatement technology of toxic arsenic, phosphoric and sulphuric pollution during semiconductor material and device processes has been studied. Sampling methods with low temperature concentration of these toxic species and their rapidly and sensitively analytical methods have been proposed. A comparison between our analytical method and the conventional ones has been shown.

关 键 词：生产工艺 尾气 砷 磷 硫 治理 检测 半导体材料 

分 类 号：X77[环境科学与工程—环境工程] TN305[电子电信—物理电子学]