离子束辅助激光制备织构薄膜的计算机模拟  

COMPUTER SIMULATION OF ALIGNED FILM PREPARED BY LASER ABLATION WITH ASSISTANT ION BEAM

作　　者：邓玉荣[1] 刘庆华[2] 黄新堂[2] 祁守仁[2] 王又青[3] 

机构地区：[1]华中师范大学物理系,武汉市430079 [2]华中师范大学 [3]华中科技大学激光技术国家重点实验室

出　　处：《材料研究学报》2001年第2期205-208,共4页Chinese Journal of Materials Research

基　　金：国家自然科学基金资助项目59602004

摘　　要：在离子束辅助激光制备取向薄膜的物理机制基础上．利用计算机模拟了织构薄膜生长的物理过程．结果表明，织构薄膜的质量直接与不同取向晶粒被辅助粒子束溅射掉的几率相关，这在实验中表现为与辅助离子束入射方向、离子束能量、薄膜材料种类等因素有关．Based on the mechanism of depositing oriented film with assistant ion beam by laser ablation , the growth development of the textured films were simulated. The oriented films deposited with assistant ion beam are the result of the higher sputtering yields of all orientation other than the retained crystallite's direction. Utilizing the simulated experiment, the relationship between the aligned film status and the film thickness (film depositing time) was discussed when aligned and non-aligned crystallites deposite on the substrate in different probabilities. The results showed that the quality of textured films is strongly dependent on the depositing probabilities of aligned and non-aligned crystallites on the substrate, and also dependent on the direction of the ion beam, the energy of the ion beam and the material of films in the experiment.

关 键 词：织构薄膜 计算机模拟 离子束辅助制备 

分 类 号：TB43[一般工业技术] O484[理学—固体物理]