消除俄歇电子能谱实验中氧化物表面荷电的新方法  

A NEW METHOD FOR COMPENSATION OF THE CHARGING OF OXIDES DURING AES

作　　者：郭汉生[1] 

机构地区：[1]北京工业大学,100022

出　　处：《材料研究学报》2000年第B01期53-57,共5页Chinese Journal of Materials Research

基　　金：教育部资助项目

摘　　要：为使俄歇电子能谱有效地用于分析氧化物，　　引入环境俄歇电子能谱方法对于消除入射电子束 对氧化物表面的损伤-包括荷电现象和氧元素电子受激脱附－６×１０－６Ｐａ Ｏ２环境比中和电子枪和低能 正离子束优越，也比 １．３×１０－２ＰａEnvironmental AES has been introduced to extend AES effectively to the analysis of the insulating materials(oxides). For compensation of the electron beam effect, including charging and electron stimulated desorption of the surface, an atmosphere of 6×10-6 Pa oxygen was superior to a flood gun and low-energy positive ions. It was also more efficiently than an Ar environment of 1 .3× 10-2 Pa.

关 键 词：俄歇电子能谱 电子受激脱附 氧化物 表面荷电 氧气环境 绝缘材料 电荷补偿机理 表面分析 

分 类 号：TM21[一般工业技术—材料科学与工程] O582[电气工程—电工理论与新技术]