CW DF/HF化学激光器性能与流场参数的相互关系  

Dependence of CW DF/HF Chemical Laser Performance on the Flowfield Parameters

作　　者：袁圣付[1] 赵伊君[1] 华卫红[1] 姜宗福[1] 

机构地区：[1]国防科技大学理学院

出　　处：《中国激光》2001年第5期402-406,共5页Chinese Journal of Lasers

摘　　要：从增益系数、输出功率、激光效率的基本公式出发 ,得到了CWDF HF化学激光器性能对光腔中F和D2 H2反应区流场参数的依赖关系。利用数值模拟结果对该关系进行了验证。给出了提高CWDF HF化学激光器性能的F和D2 H2 反应区流场参数要求 ,为CWDF/HF化学激光器喷管设计提供了依据。The relation between CW DF/HF chemical laser performance and the flowfield parameters in F&D2/H2 reacting zone has been studied based on the original formula of gain coefficient, output power and laser efficiency. The relation is proved by numerical simulation results and others' experiments and provides a criterion to optimize the nozzle design and CW DF/HF chemical laser performance.

关 键 词：CW DF/HF化学激光器 增益系数 流场参数 

分 类 号：TN248.5[电子电信—物理电子学]